Lincoln Lab transfers integrated circuit process to industry

High levels of radiation, such as those occurring naturally in space and at high altitudes on Earth, can wreak havoc on electronics. MIT’s Lincoln Laboratory has developed a unique process for making integrated circuits resistant to damage and malfunction caused by extreme radiation levels. This fabrication capability — the 90-nanometer fully depleted silicon-on-insulator (FDSOI) complementary metal-oxide-semiconductor (CMOS) process — is now being transferred to microchip manufacturer SkyWater Technology, which will use it to produce radiation-hardened, or rad-hard, electronics.  “Our 90-nanometer FDSOI CMOS process has matured and scaled, and it has…

This content is for Member members only.
Log In Register